People


 

Seong Il Jeong, Esq., Ph.D.

Patent Attorney, Of Counsel

phone 410-312-5779 (work)
fax 240-366-1263
email sijeong@koruspatent.com

 

Technical Areas

  • Mechanical Devices/Systems
  • Nanotechnology
  • Alternative Energy
  • Electromechanical Systems
  • Manufacturing
  • Medical Devices
  • Consumer Products

Education

  • J.D., Chicago-Kent Colleage of Law
  • Ph.D. in Mechanical Engineering, Texas A&M University
  • M.S. in Aerospace Engineering, Seoul National University, Korea
  • B.S. in Aerospace Engineering, Seoul National University, Korea

Bar Admissions

  • Registered to practice before the United States Patent and Trademark Office (USPTO)
  • State of Illinois

Professional Experience

Dr. Jeong is a registered patent attorney with more than 15 years of extensive work experience as a researcher/engineer. He has represented clients for several years by drafting patent applications and prosecuting patents in a broad range of technological fields, including, but not limited to, mechanical devices/systems, electromechanical systems, manufacturing, alternative energy, consumer products, communications, and business methods. He worked as a summer clerk at KIM & CHANG, the largest and most prominent law firm in South Korea.

Prior to becoming a registered patent attorney, Dr. Jeong held various positions, including those of senior research associate at Illinois Institute of Technology (IIT), senior researcher and adjunct professor at Korea Advanced Institute of Science and Technology (KAIST), National Research Council Post-Doctoral Research Associate at NASA Goddard Space Flight Center, graduate research/teaching assistant at Texas A&M University, commissioned researcher at Korea Institute of Science and Technology (KIST), and senior research engineer at SAMSUNG Aerospace Industries, Ltd. (currently Hanwha TECHWIN, Co., Ltd.). He is an author or co-author of several publications in peer-reviewed journals and a recipient of the Innovation and Creativity Prize Paper Award of IEEE Industry Applications Society (IAS) Electrostatic Processes Committee, 2004.